Articolo in rivista, 2012, , 10.1088/0957-4484/23/2/025201
G. Conte, E. Giovine, A. Bolshakov, V. Ralchenko, V. Konov
Univ. Roma Tre, I-00146 Rome, Italy; CNR, Inst Photon & Nanotechnol, I-00156 Rome, Italy; RAS, AM Prokhorov Gen Phys Inst, Moscow 119991, Russia
Metal-semiconductor field effect transistors (MESFETs) based on hydrogen terminated diamond were fabricated according to different layouts. Aluminum gates were used on single crystal and low-roughness polycrystalline diamond substrates while gold was used for ohmic contacts. Hydrogen terminated layers were deeply investigated by means of Hall bars and transfer length structures. Room temperature Hall and field effect mobility values in excess of 100 cm(2) V(-1) s(-1) were measured on commercial and single crystal epitaxial growth (100) plates by using the same hydrogenation process. Hydrogen induced two-dimensional hole gas resulted in sheet resistances essentially stable and repeatable depending on the substrate quality. Self-aligned 400 nm gate length FETs on single crystal substrates showed current density and transconductance values >100 mA mm(-1) and >40 mS mm(-1), respectively. Devices with gate length L(G) = 200 nm showed f(Max) = 26.4 GHz and f(T) = 13.2 GHz whereas those fabricated on polycrystalline diamond, with the same gate geometry, exceeded f(Max) = 23 GHz and f(T) = 7 GHz. This work focused on the optimization of a self-aligned gate structure with respect to the fixed drain-to-source structure with which we observed higher frequency values; the new structure resulted in improvement of DC characteristics, better impedance matching and a reduction in the f(Max)/f(T) ratio.
Nature nanotechnology (Print) 23
FIELD-EFFECT TRANSISTORS, TERMINATED DIAMOND, PERFORMANCE, LAYER, FETS
ID: 203002
Year: 2012
Type: Articolo in rivista
Creation: 2013-02-07 11:04:35.000
Last update: 2016-03-17 10:20:48.000
CNR authors
CNR institutes
External IDs
CNR OAI-PMH: oai:it.cnr:prodotti:203002
DOI: 10.1088/0957-4484/23/2/025201