CNR ExploRA

Contributo in atti di convegno, 2008, ENG, 10.1117/12.768507

Nitrogen-ion-implanted planar optical waveguides in Er-doped tellurite glass: Fabrication and characterization

Bányász, I.a and Berneschi, S.b and Cacciari, I.b and Fried, M.c and Lohner, T.c and Nunzi-Conti, G.b d and Pászti, F.e and Pelli, S.b and Petrik, P.c and Righini, G.C.b and Watterich, A.a and Zolnai, Z.c

Department of Crystal Physics, Research Institute of Solid State Physics and Optics, Hungarian Academy of Sciences, P.O.B. 49, H-1525, Budapest, Hungary; MDF-Lab., Nello Carrara Institute of Applied Physics, IFAC-CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino (FI), Italy; Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, P.O.B. 49, H-1525, Budapest, Hungary; Enrico Fermi Center for Study and Research, Piazza del Viminale 2, 00184 Roma, Italy; Research Institute for Particle and Nuclear Physics, Hungarian Academy of Sciences, P.O.B. 49, H-1525, Budapest, Hungary

Fabrication of channel waveguides in Er-doped tungsten-tellurite glasses was recently demonstrated. In order to get a deeper understanding of the process and to optimize the characteristics of the waveguides, we fabricated a set of planar waveguides, each of 7 mm × 7 mm lateral dimensions, in an Er-doped tellurite glass sample by implantation of 1.5 MeV nitrogen ions. Doses of the implanting ions ranged from 1 · 10 16 to 8 ·10 16 ions/cm 2. The samples were studied using interference phase contrast microscopy (Interphako), m-line spectroscopy and spectroscopic ellipsometry. The results show that a barrier layer of reduced refractive index was created around the range of the implanted ions at every dose. It is hoped that combination of the results obtained in these experiments with simulations for channel waveguides will make it possible to optimize ion-implanted fabrication of integrated optical components in this tellurite glass.

Optical Components and Materials V