Contributo in atti di convegno, 2022, ENG, 10.1117/12.2626565

Amorphous WO3 as transparent conductive oxide in the near-IR

Hao Chen, Alice Carlotto, Cristina Armellini, Marco Cassinelli, Mario Caironi, Mohamed Zaghloul, Alberto Tagliaferri, Alessandro Chiasera, Silvia M. Pietralunga

Hao Chen,1,2 Alice Carlotto,3,4 Cristina Armellini,5 Marco Cassinelli,2 Mario Caironi,2 Mohamed Zaghloul,1,2 Alberto Tagliaferri,1,2 Alessandro Chiasera,3,4 Silvia M. Pietralunga2,6 1Politecnico di Milano (Italy) 2CNST@PoliMi, Istituto Italiano di Tecnologia (Italy) 3CNR-Istituto di Fotonica e Nanotecnologie (Italy) 4 CSMFO Lab. and Fondazione Bruno Kessler (FBK) Photonics Unit (Italy) 5IFN-CNR, CSMFO Lab., FBK Photonics Unit (Italy) 6Institute for Photonics and Nanotechnologies, National Research Council (Italy)

The demand for transparent conductive films (TCFs) is dramatically increasing. In this work tungsten oxide (WO3-x) is studied as a possible option additional to the existed TCFs. We introduce WO3-x thin films fabricated by a non-reactive magnetron RF-sputtering process at room temperature, followed by thermal annealing in dry air. Films are characterized morphologically, structurally, electrically, optically, and dielectrically. Amorphous WO3-x thin films are shown to be n-type conductive while the transparency extends to the near-IR. By evaluating a figure of merit for transparent-conductive performance and comparing to some most-widely used TCFs, WO3-x turns out to outperform in the near-IR optical range

SPIE Photonics Europe, 2022, Strasbourg, France, 3 - 7 April 2022

Keywords

tungsten, rf-sputtering

CNR authors

Armellini Cristina, Tagliaferri Alberto, Carlotto Alice, Chiasera Alessandro, Pietralunga Silvia Maria

CNR institutes

IFN – Istituto di fotonica e nanotecnologie