carta G. 1, Bonafini M. 2, Kaciulis S. 3, Mezzi A. 3, Natali M. 1, Restello S. 2, Rigato V. 2, Rossetto G. 1, Salmaso G. 2, Zanella P. 1
1. ICIS - CNR - Padova 2. INFN - Laboratori di Legnaro
... Here we investigate Cr2O3 chromia film deposition via metalorganic chemical vapour deposition (MOCVD) on Fe-Cr-Ni AISI304 stainless steel (Cr18.2, Ni 9.07, Mn 1.73, Si 0.6, C 0.0022 wt%). For characterization purposes films were deposited also on (001) silicon wafers. Chromia film growth was compared for three different precursors: (1) Cr(CO)6, (2) Cr(III)hexafluoro-acetyl-acetonate and (3) tris (2,2,6,6-tetramethyl-3,5-heptane-ditionatohromium (III). The morphological, structural and chemical properties of the films were compared. The most useful precursor was found to be Cr(CO)6 and the films obtained with this precursor were further investigated by scratch testing and nonoindentation to determine the film adhesion and coating hardness.
Zanella Pierino, Carta Giovanni, Natali Marco Stefano, Rossetto Gilberto Lucio
ICIS – Istituto di chimica inorganica e delle superfici, ICMATE – Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia
ID: 61665
Year: 2003
Type: Articolo in rivista
Creation: 2009-06-16 00:00:00.000
Last update: 2019-11-25 16:17:56.000
External IDs
CNR OAI-PMH: oai:it.cnr:prodotti:61665