Articolo in rivista, 2020, ENG, 10.3390/ma13122786

Application-Oriented Growth of a Molybdenum Disulfide (MoS2) Single Layer by Means of Parametrically Optimized Chemical Vapor Deposition

Tummala, Pinakapani; Lamperti, Alessio; Alia, Mario; Kozma, Erika; Nobili, Luca Giampaolo; Molle, Alessandro

IMM CNR; CNR SCITEC; Politecnico Milano

In the 2D material framework, molybdenum disulfide (MoS2) was originally studied as an archetypical transition metal dichalcogenide (TMD) material. The controlled synthesis of large-area and high-crystalline MoS2 remains a challenge for distinct practical applications from electronics to electrocatalysis. Among the proposed methods, chemical vapor deposition (CVD) is a promising way for synthesizing high-quality MoS2 from isolated domains to a continuous film because of its high flexibility. Herein, we report on a systematic study of the effects of growth pressure, temperature, time, and vertical height between the molybdenum trioxide (MoO3) source and the substrate during the CVD process that influence the morphology, domain size, and uniformity of thickness with controlled parameters over a large scale. The substrate was pretreated with perylene-3,4,9,10-tetracarboxylic acid tetrapotassium salt (PTAS) seed molecule that promoted the layer growth of MoS2. Further, we characterized the as-grown MoS2 morphologies, layer quality, and physical properties by employing scanning electron microscopy (SEM), Raman spectroscopy, and photoluminescence (PL). Our experimental findings demonstrate the effectiveness and versatility of the CVD approach to synthesize MoS2 for various target applications.

Materials (Basel) 13 (12)

Keywords

2D materials, transition metal dichalcogenides, molybdenum disulfide, chemical vapor deposition

CNR authors

Tummala Pinaka Pani, Lamperti Alessio, Molle Alessandro, Kozma Erika, Alia Mario

CNR institutes

IMM – Istituto per la microelettronica e microsistemi