Articolo in rivista, 2019, ENG, 10.1103/PhysRevMaterials.3.100802
Li, Fengmiao; Davidson, Bruce A.; Sutarto, Ronny; Shin, Hyungki; Liu, Chong; Elfimov, Ilya; Foyevtsova, Kateryna; He, Feizhou; Sawatzky, George A.; Zou, Ke
Univ British Columbia; Univ British Columbia; Canadian Light Source
Hole-doped perovskite bismuthates such as Ba1-xKxBiO3 and Sr1-xKxBiO3 are well-known bismuth-based oxide high-transition-temperature superconductors. Reported thin bismuthate films show relatively low quality, likely due to their large lattice mismatch with the substrate and a low sticking coefficient of Bi at high temperatures. Here, we report the successful epitaxial thin film growth of the parent compound strontium bismuthate SrBiO3 on SrO-terminated SrTiO3 (001) substrates by molecular beam epitaxy. Two different growth methods, high-temperature codeposition or recrystallization cycles of low-temperature deposition plus high-temperature annealing, are developed to improve the epitaxial growth. SrBiO3 has a pseudocubic lattice constant approximate to 4.25 angstrom and an approximate to 8.8% lattice mismatch on SrTiO3 substrate, leading to a large strain in the first few unit cells. Films thicker than 6 unit cells prepared by both methods are fully relaxed to bulk lattice constant and have similar quality. Compared to high-temperature codeposition, the recrystallization method can produce higher quality 1- to 6-unit cell films that are coherently or partially strained. Photoemission experiments reveal the bonding and antibonding states close to the Fermi level due to Bi and O hybridization, in good agreement with density functional theory calculations. This work provides general guidance to the synthesis of high-quality perovskite bismuthate films.
Physical review materials (Online) 3 (10)
superconductivity, complex oxides, thin films, molecular beam epitaxy
ID: 436067
Year: 2019
Type: Articolo in rivista
Creation: 2020-11-14 09:43:11.000
Last update: 2021-01-25 23:47:20.000
CNR authors
CNR institutes
External IDs
CNR OAI-PMH: oai:it.cnr:prodotti:436067
DOI: 10.1103/PhysRevMaterials.3.100802
ISI Web of Science (WOS): 000489839400002