Articolo in rivista, 2022, ENG, 10.3390/molecules27217235

Polymorph Separation by Ordered Patterning

Cavallini, Massimiliano; Brucale, Marco; Gentili, Denis; Liscio, Fabiola; Maini, Lucia; Favaretto, Laura; Manet, Ilse; Zambianchi, Massimo; Melucci, Manuela

CNR-ISMN; CNR-ISOF;CNR-IMM, Univ Bologna; CNR

We herein address the problem of polymorph selection by introducing a general and straightforward concept based on their ordering. We demonstrated the concept by the ordered patterning of four compounds capable of forming different polymorphs when deposited on technologically relevant surfaces. Our approach exploits the fact that, when the growth of a crystalline material is confined within sufficiently small cavities, only one of the possible polymorphs is generated. We verify our method by utilizing several model compounds to fabricate micrometric "logic patterns" in which each of the printed pixels is easily identifiable as comprising only one polymorph and can be individually accessed for further operations.

Molecules (Basel, Online) 27 (21), pp. 7235–?

Keywords

polymorphism, patterning, polymorph control

CNR authors

Favaretto Laura, Manet Ilse Gert, Cavallini Massimiliano, Melucci Manuela, Brucale Marco, Gentili Denis, Liscio Fabiola, Zambianchi Massimo

CNR institutes

IMM – Istituto per la microelettronica e microsistemi, ISOF – Istituto per la sintesi organica e la fotoreattività, ISMN – Istituto per lo studio dei materiali nanostrutturati