Poster, 2006,

Analysis of the Electrical Activation of P+ Implanted Layers as a Function of the Heating Rate of the Annealing Process

Canino M, .Giannazzo F., Roccaforte F., Poggi A., Solmi S., Nipoti R.

IMM-CNR

ECSCRM (European Conference on Silicon Carbide and Related Materials), Newcastle upon Tyne, UK

Keywords

SiC, P implantation, heating rate, activation, surface roughness

CNR authors

Canino Maria Concetta, Poggi Antonella, Raineri Vito, Roccaforte Fabrizio, Giannazzo Filippo, Nipoti Roberta, Solmi Sandro

CNR institutes

IMM – Istituto per la microelettronica e microsistemi

ID: 115578

Year: 2006

Type: Poster

Creation: 2009-06-16 00:00:00.000

Last update: 2021-03-17 17:21:46.000

External links

OAI-PMH: Dublin Core

OAI-PMH: Mods

OAI-PMH: RDF

External IDs

CNR OAI-PMH: oai:it.cnr:prodotti:115578