Articolo in rivista, 2016, ENG, 10.1002/adfm.201502462

Growth and Manipulation of Organic Semiconductors Microcrystals by Wet Lithography

Gentili, Denis; Liscio, Fabiola; Mariucci, Luigi; Beverina, Luca; Melucci, Manuela; Toffanin, Stefano; Milita, Silvia; Cavallini, Massimiliano

Istituto per lo Studio dei Materiali Nanostrutturati Consiglio Nazionale delle Ricerche, Via P. Gobetti 101, 40129 Bologna, Italy; Istituto per la Microelettronica e Microsistemi Consiglio Nazionale delle Ricerche, Via P. Gobetti 101, 40121 Bologna, Italy; Istituto per la Microelettronica e Microsistemi Consiglio Nazionale delle Ricerche Tor Vergata via del Fosso del Cavaliere Rome 00133, Italy; Dipartimento di Scienza dei Materiali Università degli Studi di Milano-Bicocca Via Cozzi 55, 20125 Milan, Italy; Istituto per la sintesi Organica e la Fotoreattività Consiglio Nazionale delle Ricerche, Via P. Gobetti 101, 40129 Bologna, Italy

As fabrication and positioning of micro- and nanocrystals grow in importance in a wide range technological applications, there is an increasing requirement for the development of a shared technological platform that is able to process materials from solutions on large areas. Here, the application of lithographically controlled wetting (LCW) for the manipulation and positioning of single crystals directly on devices is reported. In the LCW, a stamp, consisting of a metallic grid, is positioned in contact with a liquid thin film spread on a substrate; under these conditions, the capillary forces pin the solution to the stamp protrusions, thus splitting the continuous film in separated droplets or channels. As the solvent evaporates and the solution reaches the saturation, the solute precipitates onto the substrate within the menisci, giving rise to a structured thin film, in correspondence of the protrusion of the stamp. The possibility to achieve a patterning of crystals of conjugated molecules with a defined shape and with controlled size directly on device is demonstrated and pattern of crystals are investigated using polarized optical microscopy, atomic force microscopy, X-ray diffraction; they are also electrically characterized.

Advanced functional materials (Print) 26 (14), pp. 2387–2393

Keywords

patterning, soft-lithography, organic semiconductors

CNR authors

Liscio Fabiola, Mariucci Luigi, Milita Silvia, Cavallini Massimiliano, Melucci Manuela, Toffanin Stefano, Gentili Denis

CNR institutes

IMM – Istituto per la microelettronica e microsistemi, ISOF – Istituto per la sintesi organica e la fotoreattività, ISMN – Istituto per lo studio dei materiali nanostrutturati